Projection exposing device

  • Inventors: SUMIYA MASATO
  • Assignees: Ushio Inc
  • Publication Date: December 12, 1991
  • Publication Number: JP-H03282475-A

Abstract

PURPOSE: To carry out exposure processing in a short period of time and to prevent generation of divergence of focus by specifying constituting material of a projection lens which projects a photomask image and average value of energy of i-rays to be absorbed. CONSTITUTION: In a projection lens on which the image of the photomask which is irradiated by a beam from the beam source consisting of a short arc type mercury vapor lamp is projected, only the i-rays or i-rays and mercury vapor lamp beam whose spectrum is on the longer wave length side of the i-rays make incidence. This projection lens is constituted from glass material whose absorption rate of i-rays is under 20%, and the average value of energy of the absorbed i-rays is within 1W. Therefore, the image of a circuit pattern can be surely exposed at a high resolution utilizing the i-rays discharged from the mercury vapor lamp effectively, and by utilizing the i-rays and the beam on the longer wave length side of the i-rays, the illuminance on a projected surface is heightened. Thus, the efficiency of exposure processing is improved and the generation of divergence of the focus can be prevented. COPYRIGHT: (C)1991,JPO&Japio

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Cited By (2)

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    JP-2005122065-AMay 12, 2005Dainippon Printing Co Ltd, 大日本印刷株式会社Aligner
    JP-2010033094-AFebruary 12, 2010Dainippon Printing Co Ltd, 大日本印刷株式会社露光装置および露光方法